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    updated on August 9, 2024

Maskless Lithography Technologies for the Advanced Micro- and Nanofabrication

     
   11 Sept. clessidra che gira 09:00 - 10:30
FRESCOES ROOM
energy
CHIPS & MICRO-NANO ELECTRONICS
TT.I Technical Multi-Track with Parallel SYMPOSIA
Maskless Lithography Technologies for the Advanced Micro- and Nanofabrication
Co-organized with Heidelberg Instruments, Gambetti Kenologia
Chairs: Christian PIES & Vasileios THEOFYLAKTOPOULOS, Heidelberg Instruments

The aim of the workshop is to bring together experts, researchers, young scientists and academics to disseminate knowledge from interdisciplinary backgrounds. The workshop shall provide a platform for discussion of current developments in direct write lithography research and promote future directions in the fabrication of nano- and micro-devices. The workshop is organized by Gambetti Kenologia and Heidelberg Instruments, a pioneer in direct write technology. The workshop program provides a forum for technology transfer and exchange of information about the advances in the field of lithography for research and development and even for production scale.


TT.I.F.1
Christian PIES - CV
Heidelberg Instruments
Direct Write Lithography – fast and flexible prototyping without photo masks
!NEUTRO  
TT.I.F.2
Vasileios THEOFYLAKTOPOULOS - CV
Heidelberg Instruments Nano
Expanding the nanolithography toolbox
!NEUTRO  
TT.I.F.3
Christian PIES
Heidelberg Instruments Mikrotechnik
The MPO 100: 3D Lithography and 3D Microprinting via Two-Photon Polymerization
!NEUTRO  
 

 

 
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INFO & CONTACTS

Dr. Federica SCROFANI

Tel. +39 06 49766676
Mob. +39 339 7714107
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